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UNIVERSITY OF OTTAWA has floated a tender for Laser Lithography System. The project location is Canada and the tender is closing on 11 Apr 2025. The tender notice number is 40151-15A-RFP, while the TOT Ref Number is 116910630. Bidders can have further information about the Tender and can request the complete Tender document by Registering on the site.
Procurement Summary
Country : Canada
Summary : Laser Lithography System
Deadline : 11 Apr 2025
Other Information
Notice Type : Tender
TOT Ref.No.: 116910630
Document Ref. No. : 40151-15A-RFP
Competition : ICB
Financier : Self Financed
Purchaser Ownership : Public
Tender Value : Refer Document
Purchaser's Detail
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Login to see detailsTender Details
Maskless laser lithography is a technology that incorporates a laser system with dynamic beam management and substrate translation to expose photoresist on a semiconductor substrate for photolithographic patterning. Maskless laser lithography represents a powerful and sustainable alternative tomask-based photolithography. This high-precision, highly flexible technology is ideal for Research and Development (R&D), rapid prototyping, and small-batch production. Maskless laser lithography eliminates the need for photomasks, reducing upfront costs, procurement and design delays - making itparticularly advantageous for low- to mid-volume production where design flexibility and quick iteration cycles are critical.The intention of this tender is to acquire an advanced laser lithography system designed for high precision, maskless lithography tasks that is versatile in accommodating varioussubstrate sizes, tailor-made for research and prototyping endeavors. This tool will be used to perform rapid prototyping of semiconductor devices within the ISO-7 (clean room environment) laboratories of the Advanced Research Center (ARC) at the University of Ottawa. The system must be fully automated, designed for advanced high-resolution lithography and incorporate adjustable writing modes to optimise writing time. The system is expected to be robust, reliable, require low maintenance and incorporate control software that is flexible, user-friendly and accessible for multiple users, including...
Solicitation Type : RFP - Request for Proposal (Formal)
Reference Number : 0000289936
Location : Canada, Ontario, Ottawa
Delivery Point : University of Ottawa
Purchase Type : One Time Only- Delivery Date:2026/04/30
Description : Maskless laser lithography is a technology that incorporates a lasersystem with dynamic beam management and substrate translation to expose photoresist on a semiconductor substrate for photolithographic patterning. Maskless laser lithography represents a powerful and sustainable alternative to mask-based photolithography. This high-precision, highly flexible technologyis ideal for Research and Development (R&D), rapid prototyping, and small-batch production. Maskless laser lithography eliminates the need for photomasks, reducing upfront costs, procurement and design delays - making it particularly advantageous for low- to mid-volume production where design flexibilityand quick iteration cycles are critical.The intention of this tender is to acquire an advanced laser lithography system designed for high precision, maskless lithography tasks that is versatile in accommodating various substrate sizes, tailor-made for research and prototyping endeavors. This tool willbe used to perform rapid prototyping of semiconductor devices within the ISO-7 (clean room environment) laboratories of the Advanced Research Center (ARC) at the University of Ottawa. The system must be fully automated, designed for advanced high-resolutionlithogra...
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