Procurement Summary
Country : Finland
Summary : Ultra-High-Vacuum Chamber for Thin-Film Synthesis
Deadline : 20 May 2022
Other Information
Notice Type : Tender
TOT Ref.No.: 65781801
Document Ref. No. : 214777-2022
Competition : ICB
Financier : Self Financed
Purchaser Ownership : Public
Tender Value : Refer Document
Purchaser's Detail
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Login to see detailsTender Details
Document Type : Contract notice
Title : Ultra-high-vacuum chamber for thin-film synthesis
Reference Number : 2022/S 080-214777
Contract Type : Supplies
Description : The Helsinki Accelerator Laboratory (HAL) at the Department of Physics of the University of Helsinki (UH) is going to acquire a multi-source ultra-high-vacuum (UHV) chamber for thin-film synthesis using magnetron sputtering and thermal evaporation. The magnetron sources will be capable of operating in direct-current magnetron sputtering (DCMS), radio-frequency magnetron sputtering (RFMS), and high-power impulse magnetron sputtering (HiPIMS) modes. Moreover, the chamber layout will allow for performing in situ and real-time measurements of film optical properties (via spectroscopic ellipsometry) and mechanical stresses (via laser deflection techniques). RFMS and HiPIMS power supplies, as well as instrumentation for spectroscopic ellipsometry and mechanical stress measurements are not part of this tender.
38000000 - Laboratory, optical and precision equipments (excl. glasses)
Authority Type : Body governed by public law
Type of Procedure : Open procedure
Regulation : European Union, with participation by GPA countries
Bid Type : Submission for all lots
Doc Title : Laboratory, optical and precision equipments (excl. glasses)
Dispatch Date : 2022-04-20
Publish Date : 2022-04-25
Submission Date : 2022-05-20
Documents
Tender Notice