Procurement Summary
Country : China
Summary : Vacuum Magnetron Sputtering Coating Equipment Procurement Project
Deadline : 30 Jul 2024
Other Information
Notice Type : Tender
TOT Ref.No.: 103874284
Document Ref. No. : 3109-244Z20243011
Competition : ICB
Financier : Self Financed
Purchaser Ownership : Public
Tender Value : Refer Document
Purchaser's Detail
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Login to see detailsTender Details
Project Name: Vacuum magnetron sputtering coating equipment procurement project
Tenders are invited for It is Proposed to be Purchased, Which can Realize Thin Film Deposition of 8 Inches of Substrate, And can Prepare Thin Film Deposition of Sulfur Compounds, Oxides, Au, Ag, Ti, Sio2 and Other Materials with a Thickness Difference of ± 5% (8 Inches). Equipped with at Least 1 Dc and 1 Rf Power Supply, The Co-Splash Deposition of 2 Target Sites can be Achieved. With an Argon Plasma Bombardment to Achieve Slight Etching. Laboratory Research and Processing of Semiconductor Material Applications, Mainly Used for the Film Deposition of Sulfur Compounds, Indium Tin Oxide, Au, Ag, Ti, Sio2 and Other Materials on the Substrate.
Products List:
1: Vacuum Magnetron Sputtering Coating Equipment
Place of Implementation: Shanghai China
Beginning of Selling Bidding Documents: 2024-07-09
Ending of Selling Bidding Documents: 2024-07-16
Price of Bidding Documents: Free
Deadline for Submitting Bids/Time of Bid Opening (Beijing Time): 2024-07-30 09:30
Documents
Tender Notice